Intern - F10 PEE CVD

Description du poste:

Our vision is to transform how the world uses information to enrich life for all.

Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing.

*Description: Crater defects in the LAM TEOS CVD process present yield and integration risks in high-volume manufacturing. This project focuses on understanding crater defect mechanisms and driving defect reduction through data analysis and controlled process optimization in F10.
*Scope:
-Understand LAM TEOS CVD process flow and chamber condition
-Analyze inline defect and yield data to characterize crater defects
-Support limited experiments (DOE / split runs) under PEE guidance
-Evaluate defect improvement vs. film performance impact
*Deliverable: Experimental results demonstrating defect reduction opportunity with assessment of impact on critical film metrics
*Skillset Require: Data analysis skills, structured problem-solving and strong learning mindset, clear technical communication skills

About Micron Technology, Inc.
We are an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich life for all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND, and NOR memory and storage products through our Micron® and Crucial® brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence and 5G applications that unleash opportunities - from the data center to the intelligent edge and across the client and mobile user experience.

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